Spectroscopy for identification of plasma sources for lithography and water window imaging

Gerry O'Sullivan, Padraig Dunne, Takeshi Higashiguchi, Bowen Li, Luning Liu, Ragava Lokasani, Elaine Long, Hayato Ohashi, Fergal O'Reilly, Paul Sheridan, Emma Sokell, Chihiro Suzuki, Tao Wu

研究成果: ジャーナルへの寄稿会議記事査読

4 被引用数 (Scopus)

抄録

The identification of sources for applications that include nanolithography, surface patterning and high resolution imaging is the focus of a considerable activity in the extreme ultraviolet (EUV) or soft x-ray (SXR) spectral regions. We report on the result of a study of the spectra from laser produced plasmas of a number of medium and high Z metals undertaken in order to identify potential sources for use with available multilayer mirrors. The main focus was the study of unresolved transition arrays emitted from ions with 3d, 4d and 4f valence subshells that emit strongly in the water window (2.34-4.38 nm).and that could be used for biological imaging or cell tomography.

本文言語英語
論文番号012026
ジャーナルJournal of Physics: Conference Series
635
1
DOI
出版ステータス出版済み - 2015/09/07
イベント29th International Conference on Photonic, Electronic and Atomic Collisions, ICPEAC 2015 - Toledo, スペイン
継続期間: 2015/07/222015/07/28

ASJC Scopus 主題領域

  • 物理学および天文学一般

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