Spectroscopy for identification of plasma sources for lithography and water window imaging

Gerry O'Sullivan; Padraig Dunne; Takeshi Higashiguchi; Bowen Li; Luning Liu; Ragava Lokasani; Elaine Long; Hayato Ohashi; Fergal O'Reilly; Paul Sheridan; Emma Sokell; Chihiro Suzuki; Tao Wu

doi:10.1088/1742-6596/635/1/012026

Spectroscopy for identification of plasma sources for lithography and water window imaging

Gerry O'Sullivan, Padraig Dunne, Takeshi Higashiguchi, Bowen Li, Luning Liu, Ragava Lokasani, Elaine Long, Hayato Ohashi, Fergal O'Reilly, Paul Sheridan, Emma Sokell, Chihiro Suzuki, Tao Wu

Faculty of Liberal Arts and Sciences

Research output: Contribution to journal › Conference article › peer-review

4 Scopus citations

Abstract

The identification of sources for applications that include nanolithography, surface patterning and high resolution imaging is the focus of a considerable activity in the extreme ultraviolet (EUV) or soft x-ray (SXR) spectral regions. We report on the result of a study of the spectra from laser produced plasmas of a number of medium and high Z metals undertaken in order to identify potential sources for use with available multilayer mirrors. The main focus was the study of unresolved transition arrays emitted from ions with 3d, 4d and 4f valence subshells that emit strongly in the water window (2.34-4.38 nm).and that could be used for biological imaging or cell tomography.

Original language	English
Article number	012026
Journal	Journal of Physics: Conference Series
Volume	635
Issue number	1
DOIs	https://doi.org/10.1088/1742-6596/635/1/012026
State	Published - 2015/09/07
Event	29th International Conference on Photonic, Electronic and Atomic Collisions, ICPEAC 2015 - Toledo, Spain Duration: 2015/07/22 → 2015/07/28

ASJC Scopus subject areas

General Physics and Astronomy

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10.1088/1742-6596/635/1/012026

Cite this

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title = "Spectroscopy for identification of plasma sources for lithography and water window imaging",

abstract = "The identification of sources for applications that include nanolithography, surface patterning and high resolution imaging is the focus of a considerable activity in the extreme ultraviolet (EUV) or soft x-ray (SXR) spectral regions. We report on the result of a study of the spectra from laser produced plasmas of a number of medium and high Z metals undertaken in order to identify potential sources for use with available multilayer mirrors. The main focus was the study of unresolved transition arrays emitted from ions with 3d, 4d and 4f valence subshells that emit strongly in the water window (2.34-4.38 nm).and that could be used for biological imaging or cell tomography.",

author = "Gerry O'Sullivan and Padraig Dunne and Takeshi Higashiguchi and Bowen Li and Luning Liu and Ragava Lokasani and Elaine Long and Hayato Ohashi and Fergal O'Reilly and Paul Sheridan and Emma Sokell and Chihiro Suzuki and Tao Wu",

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T1 - Spectroscopy for identification of plasma sources for lithography and water window imaging

AU - O'Sullivan, Gerry

AU - Dunne, Padraig

AU - Higashiguchi, Takeshi

AU - Li, Bowen

AU - Liu, Luning

AU - Lokasani, Ragava

AU - Long, Elaine

AU - Ohashi, Hayato

AU - O'Reilly, Fergal

AU - Sheridan, Paul

AU - Sokell, Emma

AU - Suzuki, Chihiro

AU - Wu, Tao

PY - 2015/9/7

Y1 - 2015/9/7

N2 - The identification of sources for applications that include nanolithography, surface patterning and high resolution imaging is the focus of a considerable activity in the extreme ultraviolet (EUV) or soft x-ray (SXR) spectral regions. We report on the result of a study of the spectra from laser produced plasmas of a number of medium and high Z metals undertaken in order to identify potential sources for use with available multilayer mirrors. The main focus was the study of unresolved transition arrays emitted from ions with 3d, 4d and 4f valence subshells that emit strongly in the water window (2.34-4.38 nm).and that could be used for biological imaging or cell tomography.

AB - The identification of sources for applications that include nanolithography, surface patterning and high resolution imaging is the focus of a considerable activity in the extreme ultraviolet (EUV) or soft x-ray (SXR) spectral regions. We report on the result of a study of the spectra from laser produced plasmas of a number of medium and high Z metals undertaken in order to identify potential sources for use with available multilayer mirrors. The main focus was the study of unresolved transition arrays emitted from ions with 3d, 4d and 4f valence subshells that emit strongly in the water window (2.34-4.38 nm).and that could be used for biological imaging or cell tomography.

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JO - Journal of Physics: Conference Series

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T2 - 29th International Conference on Photonic, Electronic and Atomic Collisions, ICPEAC 2015

Y2 - 22 July 2015 through 28 July 2015

ER -

Spectroscopy for identification of plasma sources for lithography and water window imaging

Abstract

ASJC Scopus subject areas

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