Absolute evaluation of out-of-band radiation from laser-produced tin plasmas for extreme ultraviolet lithography

Hirokazu Sakaguchi^*, Shinsuke Fujioka, Shinichi Namba, Hajime Tanuma, Hayato Ohashi, Shintaro Suda, Masashi Shimomura, Yuki Nakai, Yasuko Kimura, Yuzuri Yasuda, Hiroaki Nishimura, Takayoshi Norimatsu, Atsushi Sunahara, Katsunobu Nishihara, Noriaki Miyanaga, Yasukazu Izawa, Kunioki Mima