@article{41755f19fb13458f8f61a4db40b3dd44,
title = "Absolute evaluation of out-of-band radiation from laser-produced tin plasmas for extreme ultraviolet lithography",
abstract = "Out-of-band (OOB) radiation (at wavelengths longer than 130 nm) from an extreme ultraviolet (EUV) light source reduces the precision of lithography. The energy of the OOB radiation from laser-produced Sn plasmas were measured by using an absolutely calibrated transmission grating spectrometer equipped with a charge-coupled device. The dependence of the OOB radiant energy on the mass and size of the tin fuel was clarified. The dominant source of the OOB radiation is peripheral heating around the laser spot via electron thermal conduction and radiation from the high-temperature EUV emission region.",
author = "Hirokazu Sakaguchi and Shinsuke Fujioka and Shinichi Namba and Hajime Tanuma and Hayato Ohashi and Shintaro Suda and Masashi Shimomura and Yuki Nakai and Yasuko Kimura and Yuzuri Yasuda and Hiroaki Nishimura and Takayoshi Norimatsu and Atsushi Sunahara and Katsunobu Nishihara and Noriaki Miyanaga and Yasukazu Izawa and Kunioki Mima",
note = "Funding Information: The authors would like to thank Dr. Kaneyasu for his assistance in the UVSOR experiment and Dr. Inubushi for his help in measuring the diffraction efficiency of the TGS. This work was partially supported by the Joint Studies Program (2007) of the Institute for Molecular Science. This work was performed under the auspices of the Leading Project promoted by MEXT (Japanese Ministry of Education, Culture, Sports, Science, and Technology).",
year = "2008",
doi = "10.1063/1.2901875",
language = "英語",
volume = "92",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics",
number = "11",
}