Absolute evaluation of out-of-band radiation from laser-produced tin plasmas for extreme ultraviolet lithography

Hirokazu Sakaguchi*, Shinsuke Fujioka, Shinichi Namba, Hajime Tanuma, Hayato Ohashi, Shintaro Suda, Masashi Shimomura, Yuki Nakai, Yasuko Kimura, Yuzuri Yasuda, Hiroaki Nishimura, Takayoshi Norimatsu, Atsushi Sunahara, Katsunobu Nishihara, Noriaki Miyanaga, Yasukazu Izawa, Kunioki Mima

*この論文の責任著者

研究成果: ジャーナルへの寄稿学術論文査読

37 被引用数 (Scopus)

抄録

Out-of-band (OOB) radiation (at wavelengths longer than 130 nm) from an extreme ultraviolet (EUV) light source reduces the precision of lithography. The energy of the OOB radiation from laser-produced Sn plasmas were measured by using an absolutely calibrated transmission grating spectrometer equipped with a charge-coupled device. The dependence of the OOB radiant energy on the mass and size of the tin fuel was clarified. The dominant source of the OOB radiation is peripheral heating around the laser spot via electron thermal conduction and radiation from the high-temperature EUV emission region.

本文言語英語
論文番号111503
ジャーナルApplied Physics Letters
92
11
DOI
出版ステータス出版済み - 2008

ASJC Scopus 主題領域

  • 物理学および天文学(その他)

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