Tuning extreme ultraviolet emission for optimum coupling with multilayer mirrors for future lithography through control of ionic charge states

Hayato Ohashi, Takeshi Higashiguchi, Bowen Li, Yuhei Suzuki, Masato Kawasaki, Tatsuhiko Kanehara, Yuya Aida, Shuichi Torii, Tetsuya Makimura, Weihua Jiang, Padraig Dunne, Gerry O'Sullivan, Nobuyuki Nakamura