抄録
Suppression of dark spots formation varied with organic layer/ cathode structure has investigated. Basic structure for evaluation was ITO/ TPD+Rubrene/ Alq3/ (LiF or BCP/LiF or BCP)/ Cathode. Device structure without LiF layer, number of dark spot dramatically decreased while bright-spots appeared. By inserting BCP layer, number of dark-spots also decreased. Dark-spots disappeared for the device with BCP/AINd. Transmission electron microscope observations at the dark-spot and durability test fitted using Weibull distribution also were discussed.
本文言語 | 英語 |
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ページ | 769-770 |
ページ数 | 2 |
出版ステータス | 出版済み - 2005 |
イベント | IDW/AD'05 - 12th International Display Workshops in Conjunction with Asia Display 2005 - Takamatsu, 日本 継続期間: 2005/12/06 → 2005/12/09 |
学会
学会 | IDW/AD'05 - 12th International Display Workshops in Conjunction with Asia Display 2005 |
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国/地域 | 日本 |
City | Takamatsu |
Period | 2005/12/06 → 2005/12/09 |
ASJC Scopus 主題領域
- 工学一般