抄録
We introduce two methods to reduce the surface radiation damage of silicon strip detectors. The microscopic reason of surface radiation damage is mainly due to the generation of radiation induced interface traps. The interface traps formation occurs as a result of a series of processes initiated by the creation of electron-hole pairs in SiO2 layer and the subsequent transport of the holes to the SiO2/Si interface. To prevent the transport of holes to the SiO2/Si interface, we tried two different methods. The leakage current after irradiation decreased by 26% and 67% using these methods.
本文言語 | 英語 |
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ページ(範囲) | 38-43 |
ページ数 | 6 |
ジャーナル | Nuclear Inst. and Methods in Physics Research, A |
巻 | 514 |
号 | 1-3 |
DOI | |
出版ステータス | 出版済み - 2003/11/21 |
イベント | Proceedings of the 4th International Conference on Radiation (RESMDDo2) - 継続期間: 2002/07/10 → 2002/07/12 |
ASJC Scopus 主題領域
- 核物理学および高エネルギー物理学
- 器械工学