Patterning of photocleavable zwitterionic polymer brush fabricated on silicon wafer

Tomohiro Kamada, Yuka Yamazawa, Tadashi Nakaji-Hirabayashi, Hiromi Kitano*, Yuki Usui, Yoshiomi Hiroi, Takahiro Kishioka

*この論文の責任著者

研究成果: ジャーナルへの寄稿学術論文査読

14 被引用数 (Scopus)

抄録

Brushes of a polymer, namely poly(carboxymethylbetaine) (PCMB), were fabricated on silicon wafers by reversible addition-fragmentation chain-transfer (RAFT) polymerization using a surface-confined RAFT agent having an aromatic group at its bottom. The polymer brush showed effective suppression of the non-specific adsorption of bovine serum albumin (BSA) and adhesion of fibroblasts (3T3 cells). In contrast, BSA and 3T3 cells significantly adsorbed on and adhered to positively or negatively charged polymer brushes fabricated by the same procedure. Upon UV irradiation at 193. nm, the thickness of the PCMB brush with an aromatic group at its bottom decreased significantly whereas PCMB prepared using a surface-confined RAFT agent without an aromatic group needed a much higher irradiation dose to afford a comparable decrease in thickness. These results indicate a preferential cleavage of the PCMB brush due to photodecomposition of the phenyl group at the bottom. BSA and 3T3 cells non-specifically adsorbed on and adhered to the UV irradiation-induced hollow spaces, respectively. Furthermore, a designed pattern with a resolution of 5. μm was successfully made on the PCMB brush above the silicon wafer by simple UV irradiation. These results suggest that the surface-confined aromatic RAFT agent will be quite useful for simple photolithography in biomedical fields.

本文言語英語
ページ(範囲)878-886
ページ数9
ジャーナルColloids and Surfaces B: Biointerfaces
123
DOI
出版ステータス出版済み - 2014/11/01

ASJC Scopus 主題領域

  • バイオテクノロジー
  • 表面および界面
  • 物理化学および理論化学
  • コロイド化学および表面化学

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