Note: Development of a volume-limited dot target for a high brightness extreme ultraviolet microplasma source

Thanh Hung Dinh*, Yuhei Suzuki, Ryoichi Hirose, Hiroyuki Hara, Hayato Ohashi, Bowen Li, Padraig Dunne, Gerry O'Sullivan, Atsushi Sunahara, Takeshi Higashiguchi

*この論文の責任著者

研究成果: ジャーナルへの寄稿学術論文査読

3 被引用数 (Scopus)

抄録

We report on production of volume-limited dot targets based on electron beam lithographic and sputtering technologies for use in efficient high brightness extreme ultraviolet microplasma sources. We successfully produced cylindrical tin (Sn) targets with diameters of 10, 15, and 20 μm and a height of 150 nm. The calculated spectrum around 13.5 nm was in good agreement with that obtained experimentally.

本文言語英語
論文番号116104
ジャーナルReview of Scientific Instruments
85
11
DOI
出版ステータス出版済み - 2014/11/01

ASJC Scopus 主題領域

  • 器械工学

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