Monte-Carlo simulation on growth patterns of DAS structure on quenched Si(111) surface

T. Kato*, M. Uchibe, H. Tochihara, W. Shimada

*この論文の責任著者

    研究成果: ジャーナルへの寄稿学術論文査読

    4 被引用数 (Scopus)

    抄録

    The growth patterns of the Si(111)-(7 × 7) structure (DAS structure) on the quenched surface are calculated using Monte-Carlo simulation. The model Hamiltonian, which was constructed in terms of the states of each 7 × 7 triangular half, based on an assumption of one-by-one formation of faulted halves in the previous paper, is employed. In the simulation the out-of-phase effect for growth is taken into account. Calculated patterns of the DAS domain growth reproduce the characteristic features of the observed patterns for growths on the terrace, from the F- and U-steps, respectively.

    ASJC Scopus 主題領域

    • 凝縮系物理学
    • 表面および界面
    • 表面、皮膜および薄膜
    • 材料化学

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