Influence of sputtering conditions on the structure and properties of Ti-Si-N thin films prepared by r.f.-reactive sputtering

Keyphrases

• Sputtering Condition 100%
• Reactive Sputtering 100%
• TiSiN 100%
• Binary System 66%
• TiAlN Film 66%
• Crystallite Size 33%
• Mechanical Properties 33%
• Lattice Distortion 33%
• Young's Modulus 33%
• Room Temperature 33%
• Argon 33%
• Microstructure Properties 33%
• Nanoindentation 33%
• RF Sputtering 33%
• Si Content 33%
• Silicon Nitride 33%
• Ternary System 33%
• Columnar Grain 33%
• Substrate Heating 33%
• Nanocomposite Materials 33%
• Ti Plate 33%
• Composite Target 33%
• Without Substrate 33%
• Substrate Bias 33%
• TiSi 33%
• Negative Bias 33%

Engineering

• Crystallite Size 100%
• Lattice Distortion 100%
• Young's Modulus 100%
• Room Temperature 100%
• Thin Films 100%
• Reactive Sputtering 100%
• Nanocomposite 100%
• Indentation 100%
• Columnar Grain 100%
• Ternary System 100%
• Composite Structure 100%

Material Science

• Film 100%
• Thin Films 100%
• X-Ray Diffraction 16%
• Crystallite Size 16%
• Young's Modulus 16%
• Nanoindentation 16%
• Silicon Nitride 16%
• Nanocomposite 16%