Influence of annealing on microstructure and NO2-sensing properties of sputtered WO3 thin films

Zhifu Liu; Toshinai Yamazaki; Yanbai Shen; Toshio Kikuta; Noriyuki Nakatani

doi:10.1016/j.snb.2007.06.001

Influence of annealing on microstructure and NO₂-sensing properties of sputtered WO₃ thin films

Zhifu Liu^*, Toshinai Yamazaki, Yanbai Shen, Toshio Kikuta, Noriyuki Nakatani

^*この論文の責任著者

工学科　電気電子工学コース

研究成果: ジャーナルへの寄稿 › 学術論文 › 査読

98 被引用数 (Scopus)

抄録

The influences of thermal annealing on the microstructure and NO₂-sensing properties of sputtered WO₃ thin films were investigated. The WO₃ films as-deposited at room temperature were amorphous and would crystallize to monoclinic structure when annealed at 350 °C or above. The grains and pores in the WO₃ films grew larger with an increase in annealing temperature. The effective surface area and pore volume changed non-monotonously with increasing the annealing temperature. The film annealed at 350 °C showed the largest effective surface area. The film annealed at 500 °C had the largest pore volume. Among the films investigated in this study, the WO₃ thin film annealed at 500 °C showed the quickest response/recovery and the highest response to 10 ppm NO₂. These results indicate the importance of achieving porous structure on improving the gas sensing performance.

本文言語	英語
ページ（範囲）	173-178
ページ数	6
ジャーナル	Sensors and Actuators, B: Chemical
巻	128
号	1
DOI	https://doi.org/10.1016/j.snb.2007.06.001
出版ステータス	出版済み - 2007/12/12

ASJC Scopus 主題領域

電子材料、光学材料、および磁性材料
器械工学
凝縮系物理学
表面、皮膜および薄膜
金属および合金
電子工学および電気工学
材料化学

文献へのアクセス

10.1016/j.snb.2007.06.001

引用スタイル

@article{bdf11460176b48e5a9cee6c88bd36716,

title = "Influence of annealing on microstructure and NO2-sensing properties of sputtered WO3 thin films",

abstract = "The influences of thermal annealing on the microstructure and NO2-sensing properties of sputtered WO3 thin films were investigated. The WO3 films as-deposited at room temperature were amorphous and would crystallize to monoclinic structure when annealed at 350 °C or above. The grains and pores in the WO3 films grew larger with an increase in annealing temperature. The effective surface area and pore volume changed non-monotonously with increasing the annealing temperature. The film annealed at 350 °C showed the largest effective surface area. The film annealed at 500 °C had the largest pore volume. Among the films investigated in this study, the WO3 thin film annealed at 500 °C showed the quickest response/recovery and the highest response to 10 ppm NO2. These results indicate the importance of achieving porous structure on improving the gas sensing performance.",

keywords = "Annealing, NO sensor, Pore size, Surface area, WO thin film",

author = "Zhifu Liu and Toshinai Yamazaki and Yanbai Shen and Toshio Kikuta and Noriyuki Nakatani",

note = "Funding Information: The authors would like to thank for the support of Venture Business Laboratory of the University of Toyama. ",

year = "2007",

month = dec,

day = "12",

doi = "10.1016/j.snb.2007.06.001",

language = "英語",

volume = "128",

pages = "173--178",

journal = "Sensors and Actuators, B: Chemical",

issn = "0925-4005",

publisher = "Elsevier B.V.",

number = "1",

}

TY - JOUR

T1 - Influence of annealing on microstructure and NO2-sensing properties of sputtered WO3 thin films

AU - Liu, Zhifu

AU - Yamazaki, Toshinai

AU - Shen, Yanbai

AU - Kikuta, Toshio

AU - Nakatani, Noriyuki

N1 - Funding Information: The authors would like to thank for the support of Venture Business Laboratory of the University of Toyama.

PY - 2007/12/12

Y1 - 2007/12/12

N2 - The influences of thermal annealing on the microstructure and NO2-sensing properties of sputtered WO3 thin films were investigated. The WO3 films as-deposited at room temperature were amorphous and would crystallize to monoclinic structure when annealed at 350 °C or above. The grains and pores in the WO3 films grew larger with an increase in annealing temperature. The effective surface area and pore volume changed non-monotonously with increasing the annealing temperature. The film annealed at 350 °C showed the largest effective surface area. The film annealed at 500 °C had the largest pore volume. Among the films investigated in this study, the WO3 thin film annealed at 500 °C showed the quickest response/recovery and the highest response to 10 ppm NO2. These results indicate the importance of achieving porous structure on improving the gas sensing performance.

AB - The influences of thermal annealing on the microstructure and NO2-sensing properties of sputtered WO3 thin films were investigated. The WO3 films as-deposited at room temperature were amorphous and would crystallize to monoclinic structure when annealed at 350 °C or above. The grains and pores in the WO3 films grew larger with an increase in annealing temperature. The effective surface area and pore volume changed non-monotonously with increasing the annealing temperature. The film annealed at 350 °C showed the largest effective surface area. The film annealed at 500 °C had the largest pore volume. Among the films investigated in this study, the WO3 thin film annealed at 500 °C showed the quickest response/recovery and the highest response to 10 ppm NO2. These results indicate the importance of achieving porous structure on improving the gas sensing performance.

KW - Annealing

KW - NO sensor

KW - Pore size

KW - Surface area

KW - WO thin film

UR - http://www.scopus.com/inward/record.url?scp=35748962600&partnerID=8YFLogxK

U2 - 10.1016/j.snb.2007.06.001

DO - 10.1016/j.snb.2007.06.001

M3 - 学術論文

AN - SCOPUS:35748962600

SN - 0925-4005

VL - 128

SP - 173

EP - 178

JO - Sensors and Actuators, B: Chemical

JF - Sensors and Actuators, B: Chemical

IS - 1

ER -

Influence of annealing on microstructure and NO2-sensing properties of sputtered WO3 thin films

抄録

ASJC Scopus 主題領域

文献へのアクセス

フィンガープリント

引用スタイル

Influence of annealing on microstructure and NO₂-sensing properties of sputtered WO₃ thin films