Influence of annealing on microstructure and NO2-sensing properties of sputtered WO3 thin films

Zhifu Liu; Toshinai Yamazaki; Yanbai Shen; Toshio Kikuta; Noriyuki Nakatani

doi:10.1016/j.snb.2007.06.001

Influence of annealing on microstructure and NO₂-sensing properties of sputtered WO₃ thin films

Zhifu Liu^*, Toshinai Yamazaki, Yanbai Shen, Toshio Kikuta, Noriyuki Nakatani

^*Corresponding author for this work

Electric and Electronic Engineering

Research output: Contribution to journal › Article › peer-review

98 Scopus citations

Abstract

The influences of thermal annealing on the microstructure and NO₂-sensing properties of sputtered WO₃ thin films were investigated. The WO₃ films as-deposited at room temperature were amorphous and would crystallize to monoclinic structure when annealed at 350 °C or above. The grains and pores in the WO₃ films grew larger with an increase in annealing temperature. The effective surface area and pore volume changed non-monotonously with increasing the annealing temperature. The film annealed at 350 °C showed the largest effective surface area. The film annealed at 500 °C had the largest pore volume. Among the films investigated in this study, the WO₃ thin film annealed at 500 °C showed the quickest response/recovery and the highest response to 10 ppm NO₂. These results indicate the importance of achieving porous structure on improving the gas sensing performance.

Original language	English
Pages (from-to)	173-178
Number of pages	6
Journal	Sensors and Actuators, B: Chemical
Volume	128
Issue number	1
DOIs	https://doi.org/10.1016/j.snb.2007.06.001
State	Published - 2007/12/12

Keywords

Annealing
NO sensor
Pore size
Surface area
WO thin film

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films
Metals and Alloys
Electrical and Electronic Engineering
Materials Chemistry

Access to Document

10.1016/j.snb.2007.06.001

Cite this

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title = "Influence of annealing on microstructure and NO2-sensing properties of sputtered WO3 thin films",

abstract = "The influences of thermal annealing on the microstructure and NO2-sensing properties of sputtered WO3 thin films were investigated. The WO3 films as-deposited at room temperature were amorphous and would crystallize to monoclinic structure when annealed at 350 °C or above. The grains and pores in the WO3 films grew larger with an increase in annealing temperature. The effective surface area and pore volume changed non-monotonously with increasing the annealing temperature. The film annealed at 350 °C showed the largest effective surface area. The film annealed at 500 °C had the largest pore volume. Among the films investigated in this study, the WO3 thin film annealed at 500 °C showed the quickest response/recovery and the highest response to 10 ppm NO2. These results indicate the importance of achieving porous structure on improving the gas sensing performance.",

keywords = "Annealing, NO sensor, Pore size, Surface area, WO thin film",

author = "Zhifu Liu and Toshinai Yamazaki and Yanbai Shen and Toshio Kikuta and Noriyuki Nakatani",

note = "Funding Information: The authors would like to thank for the support of Venture Business Laboratory of the University of Toyama. ",

year = "2007",

month = dec,

day = "12",

doi = "10.1016/j.snb.2007.06.001",

language = "英語",

volume = "128",

pages = "173--178",

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T1 - Influence of annealing on microstructure and NO2-sensing properties of sputtered WO3 thin films

AU - Liu, Zhifu

AU - Yamazaki, Toshinai

AU - Shen, Yanbai

AU - Kikuta, Toshio

AU - Nakatani, Noriyuki

N1 - Funding Information: The authors would like to thank for the support of Venture Business Laboratory of the University of Toyama.

PY - 2007/12/12

Y1 - 2007/12/12

N2 - The influences of thermal annealing on the microstructure and NO2-sensing properties of sputtered WO3 thin films were investigated. The WO3 films as-deposited at room temperature were amorphous and would crystallize to monoclinic structure when annealed at 350 °C or above. The grains and pores in the WO3 films grew larger with an increase in annealing temperature. The effective surface area and pore volume changed non-monotonously with increasing the annealing temperature. The film annealed at 350 °C showed the largest effective surface area. The film annealed at 500 °C had the largest pore volume. Among the films investigated in this study, the WO3 thin film annealed at 500 °C showed the quickest response/recovery and the highest response to 10 ppm NO2. These results indicate the importance of achieving porous structure on improving the gas sensing performance.

AB - The influences of thermal annealing on the microstructure and NO2-sensing properties of sputtered WO3 thin films were investigated. The WO3 films as-deposited at room temperature were amorphous and would crystallize to monoclinic structure when annealed at 350 °C or above. The grains and pores in the WO3 films grew larger with an increase in annealing temperature. The effective surface area and pore volume changed non-monotonously with increasing the annealing temperature. The film annealed at 350 °C showed the largest effective surface area. The film annealed at 500 °C had the largest pore volume. Among the films investigated in this study, the WO3 thin film annealed at 500 °C showed the quickest response/recovery and the highest response to 10 ppm NO2. These results indicate the importance of achieving porous structure on improving the gas sensing performance.

KW - Annealing

KW - NO sensor

KW - Pore size

KW - Surface area

KW - WO thin film

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