Heteroepitaxy of InSb films grown on a Si(001) substrate with AlSb buffer layer

M. Mori*, N. Fujimoto, N. Akae, K. Uotani, T. Tambo, C. Tatsuyama

*この論文の責任著者

研究成果: ジャーナルへの寄稿学術論文査読

8 被引用数 (Scopus)

抄録

The growth of InSb films on a Si(0 0 1) substrate with AlSb buffer layer was performed in an ultra high vacuum chamber (UHV) by a co-evaporation of elemental Indium (In) and antimony (Sb) sources. The samples were characterized by Auger electron spectroscopy (AES), X-ray diffraction (XRD) and atomic force microscopy (AFM). The surface morphology and the crystal quality of the grown films strongly depend on the flux ratio of Sb/In. It is found that the optimized flux ratio for the one-step growth procedure is about 2.9 to obtain the InSb films with smooth surface and good crystal quality, for the growth temperature of 300 °C. The two-step growth procedure was also used to further improve the crystal quality of the films.

本文言語英語
ページ(範囲)218-222
ページ数5
ジャーナルJournal of Crystal Growth
286
2
DOI
出版ステータス出版済み - 2006/01/15

ASJC Scopus 主題領域

  • 凝縮系物理学
  • 無機化学
  • 材料化学

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