Formation and properties of Cr-Si sputtered alloys

Masaaki Naka*, M. Maeda, T. Shibayanagi, H. Yuan, H. Mori

*この論文の責任著者

研究成果: ジャーナルへの寄稿会議記事査読

10 被引用数 (Scopus)

抄録

Cr-Si metastable alloys were prepared by RF sputtering in a low-pressure argon gas. The structure of sputtered alloys results in Cr (Si) solid solution, Cr+Cr3Si, the amorphous phase with increasing Si content for Cr-Si alloys. The dissolution hardening effect of Si increases the microhardness of Cr(Si) solid solution. The microhardness of Cr-Si sputtered alloys yields the peak around 50 at% Si, and furthermore, the microhardness of Cr-Si alloy, with Si rich content of 80at% or more increases with Si content. These results suggest that the bonding character of Cr-Si amorphous alloys is different from the metallic-to-covalent bonding of Si-rich alloys. This bonding character difference for Cr-Si rich alloys is also seen in the Si content dependence of the crystallization temperatures for Cr-Si alloys.

本文言語英語
ページ(範囲)503-507
ページ数5
ジャーナルVacuum
65
3-4
DOI
出版ステータス出版済み - 2002/05/27
イベント3th International Symposium on Applied Plasma Science - Fairbanks, AK, 米国
継続期間: 2001/07/022001/07/06

ASJC Scopus 主題領域

  • 器械工学
  • 凝縮系物理学
  • 表面、皮膜および薄膜

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