Formation and properties of Cr-Si sputtered alloys

Masaaki Naka; M. Maeda; T. Shibayanagi; H. Yuan; H. Mori

doi:10.1016/S0042-207X(01)00463-8

Formation and properties of Cr-Si sputtered alloys

Masaaki Naka^*, M. Maeda, T. Shibayanagi, H. Yuan, H. Mori

^*Corresponding author for this work

Materials Design and Engineering

Research output: Contribution to journal › Conference article › peer-review

10 Scopus citations

Abstract

Cr-Si metastable alloys were prepared by RF sputtering in a low-pressure argon gas. The structure of sputtered alloys results in Cr (Si) solid solution, Cr+Cr₃Si, the amorphous phase with increasing Si content for Cr-Si alloys. The dissolution hardening effect of Si increases the microhardness of Cr(Si) solid solution. The microhardness of Cr-Si sputtered alloys yields the peak around 50 at% Si, and furthermore, the microhardness of Cr-Si alloy, with Si rich content of 80at% or more increases with Si content. These results suggest that the bonding character of Cr-Si amorphous alloys is different from the metallic-to-covalent bonding of Si-rich alloys. This bonding character difference for Cr-Si rich alloys is also seen in the Si content dependence of the crystallization temperatures for Cr-Si alloys.

Original language	English
Pages (from-to)	503-507
Number of pages	5
Journal	Vacuum
Volume	65
Issue number	3-4
DOIs	https://doi.org/10.1016/S0042-207X(01)00463-8
State	Published - 2002/05/27
Event	3th International Symposium on Applied Plasma Science - Fairbanks, AK, United States Duration: 2001/07/02 → 2001/07/06

Keywords

Chromium
Hardness
Metastable materials
Silicon
Sputtering
Thermal stability

ASJC Scopus subject areas

Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films

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title = "Formation and properties of Cr-Si sputtered alloys",

abstract = "Cr-Si metastable alloys were prepared by RF sputtering in a low-pressure argon gas. The structure of sputtered alloys results in Cr (Si) solid solution, Cr+Cr3Si, the amorphous phase with increasing Si content for Cr-Si alloys. The dissolution hardening effect of Si increases the microhardness of Cr(Si) solid solution. The microhardness of Cr-Si sputtered alloys yields the peak around 50 at% Si, and furthermore, the microhardness of Cr-Si alloy, with Si rich content of 80at% or more increases with Si content. These results suggest that the bonding character of Cr-Si amorphous alloys is different from the metallic-to-covalent bonding of Si-rich alloys. This bonding character difference for Cr-Si rich alloys is also seen in the Si content dependence of the crystallization temperatures for Cr-Si alloys.",

keywords = "Chromium, Hardness, Metastable materials, Silicon, Sputtering, Thermal stability",

author = "Masaaki Naka and M. Maeda and T. Shibayanagi and H. Yuan and H. Mori",

year = "2002",

month = may,

day = "27",

doi = "10.1016/S0042-207X(01)00463-8",

language = "英語",

volume = "65",

pages = "503--507",

journal = "Vacuum",

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publisher = "Elsevier Ltd.",

number = "3-4",

note = "3th International Symposium on Applied Plasma Science ; Conference date: 02-07-2001 Through 06-07-2001",

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TY - JOUR

T1 - Formation and properties of Cr-Si sputtered alloys

AU - Naka, Masaaki

AU - Maeda, M.

AU - Shibayanagi, T.

AU - Yuan, H.

AU - Mori, H.

PY - 2002/5/27

Y1 - 2002/5/27

N2 - Cr-Si metastable alloys were prepared by RF sputtering in a low-pressure argon gas. The structure of sputtered alloys results in Cr (Si) solid solution, Cr+Cr3Si, the amorphous phase with increasing Si content for Cr-Si alloys. The dissolution hardening effect of Si increases the microhardness of Cr(Si) solid solution. The microhardness of Cr-Si sputtered alloys yields the peak around 50 at% Si, and furthermore, the microhardness of Cr-Si alloy, with Si rich content of 80at% or more increases with Si content. These results suggest that the bonding character of Cr-Si amorphous alloys is different from the metallic-to-covalent bonding of Si-rich alloys. This bonding character difference for Cr-Si rich alloys is also seen in the Si content dependence of the crystallization temperatures for Cr-Si alloys.

AB - Cr-Si metastable alloys were prepared by RF sputtering in a low-pressure argon gas. The structure of sputtered alloys results in Cr (Si) solid solution, Cr+Cr3Si, the amorphous phase with increasing Si content for Cr-Si alloys. The dissolution hardening effect of Si increases the microhardness of Cr(Si) solid solution. The microhardness of Cr-Si sputtered alloys yields the peak around 50 at% Si, and furthermore, the microhardness of Cr-Si alloy, with Si rich content of 80at% or more increases with Si content. These results suggest that the bonding character of Cr-Si amorphous alloys is different from the metallic-to-covalent bonding of Si-rich alloys. This bonding character difference for Cr-Si rich alloys is also seen in the Si content dependence of the crystallization temperatures for Cr-Si alloys.

KW - Chromium

KW - Hardness

KW - Metastable materials

KW - Silicon

KW - Sputtering

KW - Thermal stability

UR - http://www.scopus.com/inward/record.url?scp=0037182081&partnerID=8YFLogxK

U2 - 10.1016/S0042-207X(01)00463-8

DO - 10.1016/S0042-207X(01)00463-8

M3 - 会議記事

AN - SCOPUS:0037182081

SN - 0042-207X

VL - 65

SP - 503

EP - 507

JO - Vacuum

JF - Vacuum

IS - 3-4

T2 - 3th International Symposium on Applied Plasma Science

Y2 - 2 July 2001 through 6 July 2001

ER -

Formation and properties of Cr-Si sputtered alloys

Abstract

Keywords

ASJC Scopus subject areas

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