Effect of angular distribution of ejected atoms from a target on the uniformity of thickness and composition of mosi_x sputtering films

The distribution of the thickness and the composition of MoSi_x films formed by the DC magnetron sputtering method was measured by varying the distance between the target and the substrate and the distribution of the erosion depth of the target. The angular distribution of the ejected atoms from the target is expected to affect the uniformity of the thickness and the composition. A model involving the effect of the angular distribution was considered to calculate the thickness and the composition, and the data were analyzed using the model. The model accounted for the data fairly well, and it was concluded that the angular distribution of the ejected atoms was very important in the determination of the distribution of the thickness and especially of the composition.