Effect of angular distribution of ejected atoms from a target on the uniformity of thickness and composition of mosix sputtering films

Toshinari Yamazaki; Kenji Matsuda; Hideo Nakatani

doi:10.1143/JJAP.29.1304

Effect of angular distribution of ejected atoms from a target on the uniformity of thickness and composition of mosi_x sputtering films

Toshinari Yamazaki^*, Kenji Matsuda, Hideo Nakatani

^*Corresponding author for this work

Materials Design and Engineering

Research output: Contribution to journal › Article › peer-review

25 Scopus citations

Abstract

The distribution of the thickness and the composition of MoSi_x films formed by the DC magnetron sputtering method was measured by varying the distance between the target and the substrate and the distribution of the erosion depth of the target. The angular distribution of the ejected atoms from the target is expected to affect the uniformity of the thickness and the composition. A model involving the effect of the angular distribution was considered to calculate the thickness and the composition, and the data were analyzed using the model. The model accounted for the data fairly well, and it was concluded that the angular distribution of the ejected atoms was very important in the determination of the distribution of the thickness and especially of the composition.

Original language	English
Pages (from-to)	1304-1309
Number of pages	6
Journal	Japanese Journal of Applied Physics
Volume	29
Issue number	7
DOIs	https://doi.org/10.1143/JJAP.29.1304
State	Published - 1990/07

Keywords

Angular distribution
Composition
Molybdenum silicide
Sputtering
Thickness
Thinfilm
Uniformity

ASJC Scopus subject areas

General Engineering
General Physics and Astronomy

Access to Document

10.1143/JJAP.29.1304

Cite this

@article{2a4d28acaf2c4843b6aaaf5f3bf52ab9,

title = "Effect of angular distribution of ejected atoms from a target on the uniformity of thickness and composition of mosix sputtering films",

abstract = "The distribution of the thickness and the composition of MoSix films formed by the DC magnetron sputtering method was measured by varying the distance between the target and the substrate and the distribution of the erosion depth of the target. The angular distribution of the ejected atoms from the target is expected to affect the uniformity of the thickness and the composition. A model involving the effect of the angular distribution was considered to calculate the thickness and the composition, and the data were analyzed using the model. The model accounted for the data fairly well, and it was concluded that the angular distribution of the ejected atoms was very important in the determination of the distribution of the thickness and especially of the composition.",

keywords = "Angular distribution, Composition, Molybdenum silicide, Sputtering, Thickness, Thinfilm, Uniformity",

author = "Toshinari Yamazaki and Kenji Matsuda and Hideo Nakatani",

year = "1990",

month = jul,

doi = "10.1143/JJAP.29.1304",

language = "英語",

volume = "29",

pages = "1304--1309",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "7",

}

TY - JOUR

T1 - Effect of angular distribution of ejected atoms from a target on the uniformity of thickness and composition of mosix sputtering films

AU - Yamazaki, Toshinari

AU - Matsuda, Kenji

AU - Nakatani, Hideo

PY - 1990/7

Y1 - 1990/7

N2 - The distribution of the thickness and the composition of MoSix films formed by the DC magnetron sputtering method was measured by varying the distance between the target and the substrate and the distribution of the erosion depth of the target. The angular distribution of the ejected atoms from the target is expected to affect the uniformity of the thickness and the composition. A model involving the effect of the angular distribution was considered to calculate the thickness and the composition, and the data were analyzed using the model. The model accounted for the data fairly well, and it was concluded that the angular distribution of the ejected atoms was very important in the determination of the distribution of the thickness and especially of the composition.

AB - The distribution of the thickness and the composition of MoSix films formed by the DC magnetron sputtering method was measured by varying the distance between the target and the substrate and the distribution of the erosion depth of the target. The angular distribution of the ejected atoms from the target is expected to affect the uniformity of the thickness and the composition. A model involving the effect of the angular distribution was considered to calculate the thickness and the composition, and the data were analyzed using the model. The model accounted for the data fairly well, and it was concluded that the angular distribution of the ejected atoms was very important in the determination of the distribution of the thickness and especially of the composition.

KW - Angular distribution

KW - Composition

KW - Molybdenum silicide

KW - Sputtering

KW - Thickness

KW - Thinfilm

KW - Uniformity

UR - http://www.scopus.com/inward/record.url?scp=0025455916&partnerID=8YFLogxK

U2 - 10.1143/JJAP.29.1304

DO - 10.1143/JJAP.29.1304

M3 - 学術論文

AN - SCOPUS:0025455916

SN - 0021-4922

VL - 29

SP - 1304

EP - 1309

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 7

ER -