Keyphrases
Sputtering Method
100%
Surface Coating
100%
Titanium Nitride
100%
Aluminum Flake
100%
Nitrided Layer
100%
Total Pressure
50%
Al Flake
50%
TiN Layer
50%
Radio Frequency Power
50%
TiN Film
50%
Substrate Temperature
25%
Spectroscopic Measurement
25%
Room Temperature
25%
Optical Microscopy
25%
Scanning Electron Microscopy
25%
Glass Substrate
25%
Fine Particles
25%
X-ray Diffraction Measurement
25%
Sputtering Condition
25%
Electron Energy
25%
Energy Dispersive X-ray Spectroscopy
25%
Reactive Sputtering
25%
XRD Pattern
25%
Flake-shaped
25%
Material Science
Film
100%
X-Ray Diffraction
100%
Aluminum
100%
Nitride Compound
100%
Surface Coating
100%
Titanium
100%
Scanning Electron Microscopy
50%
Fine Particle
50%
Diffraction Measurement
50%
Energy-Dispersive X-Ray Spectroscopy
50%
Surface (Surface Science)
50%
Engineering
Surface Coating
100%
Radio Frequency
100%
Nitride Layer
100%
Energy Engineering
50%
Substrate Temperature
50%
Room Temperature
50%
Ray Diffraction
50%
Reactive Sputtering
50%
Glass Substrate
50%