Surface coating on aluminum flakes with titanium nitride layer by barrel-sputtering techniques

Flake-shaped fine particles were modified with a thin TiN layer by a hexagonal-barrel-sputtering technique. To determine the optimum sputtering conditions. TiN films were deposited on a glass substrate by the reactive sputtering technique by varying the values of N₂ percentage, total pressure, radio-frequency (RF) power, and substrate temperature. From the analysis of XRD patterns, it was determined that a N₂ percentage of 25%. a total pressure of 1.2 Pa. a RF power of 200 W, and room temperature were suitable for the preparation of TiN films. Under these optimized conditions. Al flakes were modified with a TiN by the barrel-sputtering technique. The results of optical microscopy. X-ray diffraction measurements, scanning electron microscopy, and energy-dispersive X-ray spectroscopy measurements revealed that the surface of each Al flake was successfully coated uniformly with a TiN layer.