Spectroscopy for identification of plasma sources for lithography and water window imaging

Gerry O'Sullivan, Padraig Dunne, Takeshi Higashiguchi, Bowen Li, Ragava Lokasani, Elaine Long, Hayato Ohashi, Fergal O'Reilly, Paul Sheridan, John Sheil, Emma Sokell, Chihiro Suzuki, Tao Wu

Research output: Contribution to journalConference articlepeer-review

Abstract

We report on the result of an extensive study of the extreme ultraviolet (EUV) and soft x-ray spectra from laser produced plasmas of a number of medium and high Z metals undertaken to identify potential sources for use with multilayer mirrors as sources for lithography and water window imaging and cell tomography.

Original languageEnglish
Article number092037
JournalJournal of Physics: Conference Series
Volume635
Issue number9
DOIs
StatePublished - 2015/09/07
Event29th International Conference on Photonic, Electronic and Atomic Collisions, ICPEAC 2015 - Toledo, Spain
Duration: 2015/07/222015/07/28

ASJC Scopus subject areas

  • General Physics and Astronomy

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