Role of nitrogen in the formation of CN x films by pulsed laser deposition

Zhiping Wang; Hiroaki Ito; Katsumi Masugata

doi:10.1109/TPS.2012.2197224

Role of nitrogen in the formation of CN _x films by pulsed laser deposition

Zhiping Wang^*, Hiroaki Ito, Katsumi Masugata

^*Corresponding author for this work

Electric and Electronic Engineering

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

Carbon nitride (CN _x) films, deposited by pulsed laser deposition (PLD) in nitrogen (N ₂) atmosphere, were studied with respect to mechanical, morphological, compositional, structural, and optical properties. All the samples were prepared at room temperature and under various N ₂ pressures, ranging from vacuum up to 50 Pa. Nitrogen concentration (C _N) rapidly increases with increasing N ₂ pressure and reaches to a saturated value above 10 Pa. The Raman results reveal that the D/G ratio increases with the increase in N ₂ pressure, contributing the graphitization of carbon films. With further addition of nitrogen into carbon films, optical transmission is enhanced. Localization of the π electrons due to the heteropolar bonding and the high porosity of the CN _x samples are speculated to be the reason of enhancement in optical transmission.

Original language	English
Article number	A9
Pages (from-to)	1815-1819
Number of pages	5
Journal	IEEE Transactions on Plasma Science
Volume	40
Issue number	7 PART 1
DOIs	https://doi.org/10.1109/TPS.2012.2197224
State	Published - 2012

Keywords

Carbon nitride
Nitrogen gas effect
Pulsed laser deposition (PLD)

ASJC Scopus subject areas

Nuclear and High Energy Physics
Condensed Matter Physics

Access to Document

10.1109/TPS.2012.2197224

Cite this

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title = "Role of nitrogen in the formation of CN x films by pulsed laser deposition",

abstract = "Carbon nitride (CN x) films, deposited by pulsed laser deposition (PLD) in nitrogen (N 2) atmosphere, were studied with respect to mechanical, morphological, compositional, structural, and optical properties. All the samples were prepared at room temperature and under various N 2 pressures, ranging from vacuum up to 50 Pa. Nitrogen concentration (C N) rapidly increases with increasing N 2 pressure and reaches to a saturated value above 10 Pa. The Raman results reveal that the D/G ratio increases with the increase in N 2 pressure, contributing the graphitization of carbon films. With further addition of nitrogen into carbon films, optical transmission is enhanced. Localization of the π electrons due to the heteropolar bonding and the high porosity of the CN x samples are speculated to be the reason of enhancement in optical transmission.",

keywords = "Carbon nitride, Nitrogen gas effect, Pulsed laser deposition (PLD)",

author = "Zhiping Wang and Hiroaki Ito and Katsumi Masugata",

year = "2012",

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language = "英語",

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pages = "1815--1819",

journal = "IEEE Transactions on Plasma Science",

issn = "0093-3813",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

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TY - JOUR

T1 - Role of nitrogen in the formation of CN x films by pulsed laser deposition

AU - Wang, Zhiping

AU - Ito, Hiroaki

AU - Masugata, Katsumi

PY - 2012

Y1 - 2012

N2 - Carbon nitride (CN x) films, deposited by pulsed laser deposition (PLD) in nitrogen (N 2) atmosphere, were studied with respect to mechanical, morphological, compositional, structural, and optical properties. All the samples were prepared at room temperature and under various N 2 pressures, ranging from vacuum up to 50 Pa. Nitrogen concentration (C N) rapidly increases with increasing N 2 pressure and reaches to a saturated value above 10 Pa. The Raman results reveal that the D/G ratio increases with the increase in N 2 pressure, contributing the graphitization of carbon films. With further addition of nitrogen into carbon films, optical transmission is enhanced. Localization of the π electrons due to the heteropolar bonding and the high porosity of the CN x samples are speculated to be the reason of enhancement in optical transmission.

AB - Carbon nitride (CN x) films, deposited by pulsed laser deposition (PLD) in nitrogen (N 2) atmosphere, were studied with respect to mechanical, morphological, compositional, structural, and optical properties. All the samples were prepared at room temperature and under various N 2 pressures, ranging from vacuum up to 50 Pa. Nitrogen concentration (C N) rapidly increases with increasing N 2 pressure and reaches to a saturated value above 10 Pa. The Raman results reveal that the D/G ratio increases with the increase in N 2 pressure, contributing the graphitization of carbon films. With further addition of nitrogen into carbon films, optical transmission is enhanced. Localization of the π electrons due to the heteropolar bonding and the high porosity of the CN x samples are speculated to be the reason of enhancement in optical transmission.

KW - Carbon nitride

KW - Nitrogen gas effect

KW - Pulsed laser deposition (PLD)

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