Emission of water-window soft x-rays under optically thin conditions using low-density foam targets

Hiroyuki Hara; Hiromu Kawasaki; Toshiki Tamura; Tadashi Hatano; Takeo Ejima; Weihua Jiang; Hayato Ohashi; Shinichi Namba; Atsushi Sunahara; Akira Sasaki; Masaharu Nishikino; Gerry O’Sullivan; Takeshi Higashiguchi

doi:10.1364/OL.43.003750

Emission of water-window soft x-rays under optically thin conditions using low-density foam targets

Hiroyuki Hara, Hiromu Kawasaki, Toshiki Tamura, Tadashi Hatano, Takeo Ejima, Weihua Jiang, Hayato Ohashi, Shinichi Namba, Atsushi Sunahara, Akira Sasaki, Masaharu Nishikino, Gerry O’Sullivan, Takeshi Higashiguchi^*

^*Corresponding author for this work

Faculty of Liberal Arts and Sciences

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

The effect of optical thickness in a bismuth water-window soft x-ray source is considered by comparing the emission from laser-produced plasmas of a 7.5% atomic density foam target and a solid-density target. The number of photons recorded in the 4 nm region was comparable for both targets at a plasma-initiating laser pulse duration of 6 ns. From experiments at different pulse durations of 150 ps and 6 ns, self-absorption (opacity) effects were found to be relatively small for bismuth plasmas as compared to those of tin, based on the same emission mechanism and which are used in 13.5 nm sources for extreme ultraviolet lithography.

Original language	English
Pages (from-to)	3750-3753
Number of pages	4
Journal	Optics Letters
Volume	43
Issue number	15
DOIs	https://doi.org/10.1364/OL.43.003750
State	Published - 2018/08/01

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics

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title = "Emission of water-window soft x-rays under optically thin conditions using low-density foam targets",

abstract = "The effect of optical thickness in a bismuth water-window soft x-ray source is considered by comparing the emission from laser-produced plasmas of a 7.5% atomic density foam target and a solid-density target. The number of photons recorded in the 4 nm region was comparable for both targets at a plasma-initiating laser pulse duration of 6 ns. From experiments at different pulse durations of 150 ps and 6 ns, self-absorption (opacity) effects were found to be relatively small for bismuth plasmas as compared to those of tin, based on the same emission mechanism and which are used in 13.5 nm sources for extreme ultraviolet lithography.",

author = "Hiroyuki Hara and Hiromu Kawasaki and Toshiki Tamura and Tadashi Hatano and Takeo Ejima and Weihua Jiang and Hayato Ohashi and Shinichi Namba and Atsushi Sunahara and Akira Sasaki and Masaharu Nishikino and Gerry O{\textquoteright}Sullivan and Takeshi Higashiguchi",

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doi = "10.1364/OL.43.003750",

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T1 - Emission of water-window soft x-rays under optically thin conditions using low-density foam targets

AU - Hara, Hiroyuki

AU - Kawasaki, Hiromu

AU - Tamura, Toshiki

AU - Hatano, Tadashi

AU - Ejima, Takeo

AU - Jiang, Weihua

AU - Ohashi, Hayato

AU - Namba, Shinichi

AU - Sunahara, Atsushi

AU - Sasaki, Akira

AU - Nishikino, Masaharu

AU - O’Sullivan, Gerry

AU - Higashiguchi, Takeshi

PY - 2018/8/1

Y1 - 2018/8/1

N2 - The effect of optical thickness in a bismuth water-window soft x-ray source is considered by comparing the emission from laser-produced plasmas of a 7.5% atomic density foam target and a solid-density target. The number of photons recorded in the 4 nm region was comparable for both targets at a plasma-initiating laser pulse duration of 6 ns. From experiments at different pulse durations of 150 ps and 6 ns, self-absorption (opacity) effects were found to be relatively small for bismuth plasmas as compared to those of tin, based on the same emission mechanism and which are used in 13.5 nm sources for extreme ultraviolet lithography.

AB - The effect of optical thickness in a bismuth water-window soft x-ray source is considered by comparing the emission from laser-produced plasmas of a 7.5% atomic density foam target and a solid-density target. The number of photons recorded in the 4 nm region was comparable for both targets at a plasma-initiating laser pulse duration of 6 ns. From experiments at different pulse durations of 150 ps and 6 ns, self-absorption (opacity) effects were found to be relatively small for bismuth plasmas as compared to those of tin, based on the same emission mechanism and which are used in 13.5 nm sources for extreme ultraviolet lithography.

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DO - 10.1364/OL.43.003750

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JO - Optics Letters

JF - Optics Letters

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Emission of water-window soft x-rays under optically thin conditions using low-density foam targets

Abstract

ASJC Scopus subject areas

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