Diffusion behavior of sulfur in p(1×1) phase of S/Ni(1 0 0) system

S. Tsukawaki, Y. Hatano, K. Hashizume, M. Sugisaki

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

The surface phase diagram of S/Ni(1 0 0) in a temperature region from room temperature to 1100 K has been examined by reflection high energy electron diffraction observation, and the temperature and sulfur coverage regions of the p(1×1) phase have been determined. The temperature dependence of surface diffusion coefficient of sulfur in the p(1×1) phase has been measured with micro-probe Auger electron spectroscopy in a temperature region from 820 to 900 K and in a sulfur coverage region from 0.03 to 0.07 ML. The obtained diffusion coefficient in the p(1×1) phase is expressed as D (cm2/s) = 1.0×10-2 exp(-1.0±0.1 (eV)/kBT).

Original languageEnglish
Pages (from-to)115-120
Number of pages6
JournalSurface Science
Volume476
Issue number1-2
DOIs
StatePublished - 2001/03/20

Keywords

  • Nickel
  • Sulphur
  • Surface diffusion
  • Surface structure, morphology, roughness, and topography

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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