Effect of Angular Distribution on Ejected Atoms from Target on Uniformity of Composition of Sputtering Films.

  • Yamazaki, Toshinari (Principal Investigator)

Project Details

Abstract

The composition distribution of alloy films formed by composite targets and the thickness distribution of metal films formed by metal targets were also studied, although those problems might be somewhat apart from the title of the project. Using Al-Cu fan-shaped composite targets, the relationship between the number of pairs of Al and Cu fans in a target and the uniformity of the film composition was investigated. It was found that the pair number should be more than about 16 in order to obtain uniform composition. With respect to the thickness distribution of metal films, those of Al, Cu and Mo films were measured. Their thickness distributions showed behavior which suggests that the atoms are apt to be sputtered normally with the increase in the discharge voltage.
StatusFinished
Effective start/end date1990/01/011991/12/31

Funding

  • Japan Society for the Promotion of Science: ¥1,500,000.00

Keywords

  • スパッタ
  • 角度分布
  • 薄膜
  • 均一性
  • モリブデンシリサイド
  • 膜厚
  • 組成
  • スパッタリング
  • モリブデシシリサイド
  • 組成均一性
  • Sputtering
  • Angular Distribution
  • Thin Film
  • Uniformity
  • Molybdenum Silicide
  • Thickness
  • Composition