Yttria stabilized zirconia thin films formation from an aqueous solution by mist deposition

In our present study, YSZ thin films were fabricated from aqueous solution by mist deposition. Composition and concentration or the solution is 94mol%ZrO₂-6mol%YO_1.5 and 0.02-0.15 mol/dm³. ZrO(NO₃)₂-2H₂O and Y(NO₃) ₃-6H₂O were used as Zr and Y sources, The solution was misted by using ultrasonic nebulizer and deposited on the heated glass substrates, which were heated from 373 to 623 K. By using this method transparent, pure, amorphous thin films were grown up on glass surface when substrate temperature was between 423 to 523 K, and which thickness were about 0.2 to 0.4μm. Crystalline YSZ films could be obtained after annealing at 773 K for 30 min in air. XRD profiles from the thin films deposited ut 473 K showed tetragonal phase. Diffraction peaks indicate that films were mainly preferentially oriented to (111) direction to the surface of the glass substrate, Milky and rough YSZ films were formed when deposition temperature were over 523 K. Monoclinic phase was detected when deposition temperature was higher than 523 K or lower than 423 K after heat treatment.