Nanoscale fabrication in aqueous KOH solution using tribo-nanolithography

Noritaka Kawasegi*, Jeong Woo Park, Noboru Morita, Shigeru Yamada, Noboru Takano, Tatsuo Oyama, Kiwamu Ashida

*この論文の責任著者

研究成果: ジャーナルへの寄稿学術論文査読

3 被引用数 (Scopus)

抄録

A simple process to fabricate a three-dimensional structure on silicon surface was developed by using tribo-nanolithography (TNL) in an aqueous KOH solution. An inclined rectangular structure can be fabricated by a process where a thin amorphous layer, having corrosion resistance against KOH, rapidly forms on the substrate at the diamond tip sample junction along the scanning pass of the tip, while simultaneously, the area not covered with the amorphous layer is being etched in KOH. An inclination of structure can be controlled by the scanning velocity. The scanning pitch is related to the corrosion resistance of the amorphous layer, rather than the change of inclination. We fabricated a structure having multiple inclinations based on these results, which indicates the possibility of using the TNL for three-dimensional nanofabrication.

本文言語英語
ページ(範囲)2471-2475
ページ数5
ジャーナルJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
23
6
DOI
出版ステータス出版済み - 2005/11

ASJC Scopus 主題領域

  • 凝縮系物理学
  • 電子工学および電気工学

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