Interfacial structure of erbium oxide layer on SUS316 substrate formed by MOCVD method

Takayuki Shinkawa, Kenji Matsuda*, Yoshimitsu Hishinuma, Katsuhiko Nishimura, Teruya Tanaka, Takeo Muroga, Takahiro Sato

*この論文の責任著者

研究成果: ジャーナルへの寄稿学術論文査読

3 被引用数 (Scopus)

抄録

The Er2O3 layer fabricated by MOCVD method on SUS316 substrates before and after hydrogen permeation test were investigated to know their surface morphology and structure by SEM and TEM. The surface morphology of this layer was granular structure with size of about 0.30.6 μm in diameter. According to the cross sectional TEM (X-TEM) observation, the Er2O3 layer with 11.3 μm thickness was formed on SUS316 substrate by MOCVD method in this research and no remarkable defects or cracks were detected. The Er2O3 layer had the columnar structure and their mean width was 0.30.5 μm, and it is also in good agreement with mean width of a single column measured by TEM observation. The growth direction of Er2O3 column was 〈110〉Er2O3, which is the same with as each sample before and after hydrogen permeation test, it strongly suggested that the Er2O3 is a better candidate material for insulating coating of a liquid lithium blanket.

本文言語英語
ページ(範囲)1781-1785
ページ数5
ジャーナルMaterials Transactions
55
12
DOI
出版ステータス出版済み - 2014

ASJC Scopus 主題領域

  • 材料科学一般
  • 凝縮系物理学
  • 材料力学
  • 機械工学

フィンガープリント

「Interfacial structure of erbium oxide layer on SUS316 substrate formed by MOCVD method」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル