Formation of Erbia-Yttria double layer fabricated by metal organic chemical vapor deposition process with changing oxygen flow rates

Seungwon Lee, Kenji Matsuda*, Masaki Tanaka, Taiki Tsuchiya, Katsuhiko Nishimura, Yoshimitsu Hishinuma, Teruya Tanaka, Takeo Muroga

*この論文の責任著者

研究成果: ジャーナルへの寄稿学術論文査読

1 被引用数 (Scopus)

抄録

Er2O3 and Y2O3 are promising materials for advanced breeding blanket system of nuclear fusion reactor because they have high electrical resistivity and effective tritium permeation suppression. In this report, Er2O3 thin films were fabricated by metal organic chemical vapor deposition (MO-CVD) process with changing oxygen flow rates on the stainless steel 316 (SUS316) substrate with Y2O3 layer fabricated via radio frequency (RF)-sputtering. Samples were prepared with four conditions of oxygen rate, 0.08, 0.13, 0.25, 0.42 Pa∙m3/s (50, 75, 150 and 250 sccm, respectively) and only on Er2O3 / Y2O3–0.42 Pa∙m3/s sample was added thermal cycles. Four samples were observed with using X-ray diffraction (XRD), atomic force microscopy (AFM) and transmission electron microscopy (TEM). Increasing oxygen flow rate during MO-CVD process increased the thickness of Er2O3 thin film and decreased columnar width and succeeded in fabricating Er2O3 thin film and dense microstructure on the SUS 316 substrate with Y2O3 layer.

本文言語英語
論文番号137455
ジャーナルThin Solid Films
689
DOI
出版ステータス出版済み - 2019/11/01

ASJC Scopus 主題領域

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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