Fabrication of field-effect transistor devices with new type of fullerodendron

Yuuki Sako*, Yutaka Takaguchi, Yu Kusai, Nagano Takayuki, Kubozono Yoshihiro

*この論文の責任著者

研究成果: 会議への寄与学会論文査読

抄録

New types of n-channel field-effect transistor (FET) devices have been fabricated with thin films of fullerodendron on SiO2/Si, polyimide/Au/poly(ethylene terephthalate) and polyvinyl alcohol/Au/ poly(ethylene terephthalate) substrates by using solution-processes. The value of field-effect mobility, μ, of the fullerodendron FET reachs 1.7 × 10-3 cm2 V-1 s-1 at 300 K. The mobility gap and optical gap have been estimated to be 0.30 and 1.4 eV, respectively. The films of fullerodendron are not amorphous but crystalline. The electron transport is expected to occur through overlap of π-orbitals between the C60 moieties, and the channel conduction in the FET device follows thermally-activated hopping-transport mechanism with activation energy of 0.21 eV.

本文言語英語
ページ1375
ページ数1
出版ステータス出版済み - 2006
イベント55th SPSJ Annual Meeting - Nagoya, 日本
継続期間: 2006/05/242006/05/26

学会

学会55th SPSJ Annual Meeting
国/地域日本
CityNagoya
Period2006/05/242006/05/26

ASJC Scopus 主題領域

  • 工学一般

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