抄録
W nano-structures (fuzz), produced in the linear high plasma device, NAGDIS, were exposed to TEXTOR edge plasmas (ohmic He/D mixed plasma and pure D plasma) to study formation, erosion and C deposition on W fuzz in tokamak plasmas for the first time. Fuzz layers were either completely eroded or covered by C deposit. There was no clear indication of W fuzz growth under the present conditions. There was no significant difference of C deposition between 'thick' fuzz (500-600 nm in thickness) and 'thin' fuzz (300-400 nm) in the He/D plasma. On the W fuzz surface, C deposition was enhanced probably due to reduction of effective sputtering yield and effective reflection coefficient of carbon ions, similar to roughness effects. Formation and erosion of W fuzz in tokamak devices and role of impurities are discussed.
本文言語 | 英語 |
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ページ(範囲) | S92-S95 |
ジャーナル | Journal of Nuclear Materials |
巻 | 415 |
号 | 1 SUPPL |
DOI | |
出版ステータス | 出版済み - 2011/08/01 |
ASJC Scopus 主題領域
- 核物理学および高エネルギー物理学
- 材料科学一般
- 原子力エネルギーおよび原子力工学