Electrical characterization of n+-InSb/p-Si heterojunctions grwon by surface reconstruction controlled epitaxy

K. Kimura, K. Hosotani, T. Ito, H. Shimoyama, T. Sakamoto, M. Mori, K. Maezawa

研究成果: 書籍の章/レポート/会議録会議への寄与査読

抄録

This paper discusses the characteristics of the InSb/Si heterojunctions. Thin epitaxial layers of the InSb were grown on p-Si substrate by using the surface reconstruction controlled epitaxy. This epitaxial growth technique permits us to grow high quality InSb on Si (111) surface. The n-InSb/p-Si heterojunction pn diodes were fabricated with these samples, and characterized by current-voltage, and capacitance-voltage measurements. The conduction and valence band discontinuities were estimated from these results, and they were discussed compared to those obtained from the electron affinity rule.

本文言語英語
ホスト出版物のタイトルIMFEDK 2014 - 2014 International Meeting for Future of Electron Devices, Kansai
出版社Institute of Electrical and Electronics Engineers Inc.
ISBN(電子版)9781479936144
DOI
出版ステータス出版済み - 2014/07/28
イベント12th International Meeting for Future of Electron Devices, Kansai, IMFEDK 2014 - Kyoto, 日本
継続期間: 2014/06/192014/06/20

出版物シリーズ

名前IMFEDK 2014 - 2014 International Meeting for Future of Electron Devices, Kansai

学会

学会12th International Meeting for Future of Electron Devices, Kansai, IMFEDK 2014
国/地域日本
CityKyoto
Period2014/06/192014/06/20

ASJC Scopus 主題領域

  • 電子工学および電気工学

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