Delocalization of the f electron in CexLa1-xRu 2Si2 - The de Haas-van Alphen effect measurement

Y. Matsumoto*, N. Kimura, T. Komatsubara, H. Aoki, N. Kurita, T. Terashima, S. Uji

*この論文の責任著者

研究成果: ジャーナルへの寄稿会議記事査読

1 被引用数 (Scopus)

抄録

We report the first observation of the continuous Fermi surface (FS) variation from La compound (LaRu2Si2) with no f electron to Ce compound (CeRu2Si2) with itinerant f electron via the de Haas-van Alphen (dHvA) effect. The dHvA frequency smoothly varies with Ce concentration and there is no discontinuous change with Ce concentration. It is found that the effective mass and signal amplitude with Ce concentration depends strongly on the Fermi surface sheet, and the effective mass is enhanced toward xc (= 0.91) and the signal amplitude reduces around xc or somewhere between xc and x ∼ 0.8.

本文言語英語
論文番号012042
ジャーナルJournal of Physics: Conference Series
391
1
DOI
出版ステータス出版済み - 2012
イベントInternational Conference on Strongly Correlated Electron Systems, SCES 2011 - Cambridge, 英国
継続期間: 2011/08/292011/09/03

ASJC Scopus 主題領域

  • 物理学および天文学一般

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