Thickness distribution of metal films by magnetron sputtering (II) -ešect of the distance between the target and substrate and the erosion distribution-

The distribution of the thickness of the ̂lms formed by magnetron sputtering depends on elements because the angular distribution of the sputtered atoms depends on elements. In this study, the angular distributions were expressed by cosⁿ or cos (1+β cos²). The former is appropriate for expressing over-cosine while the latter is appropriate for expressing under-cosine. The parameters n and b were determined so that the thickness distributions calculated reproduce the ones measured in the previous study. Once these parameters are determined, it is expected that the thickness distributions for dišerent geometry of the sputtering apparatus can be predicted by calculation. Thickness distributions were measured for Pt, Cu, and C with the target-to-substrate distance and the diameter of the erosion ring variously changed. They approximately agreed with the calculated ones.