TY - JOUR
T1 - The formation mechanism of the higher performanceV3Ga phase on the high Ga content Cu-Ga compound/V diffusion reaction through the high-temperature XRD analysis
AU - Hishinuma, Y.
AU - Kikuchi, A.
AU - Murakami, S.
AU - Matsuda, K.
AU - Taniguchi, H.
AU - Takeuchi, T.
N1 - Publisher Copyright:
© 2012 Published by Elsevier B.V. Selection and/or peer-review under responsibility of the Guest Editors.
PY - 2012
Y1 - 2012
N2 - V3Ga compound has a shorter radioactive decay time compared with Nb-based compounds and it will be one of the candidate superconducting magnet materials for advanced low activation fusion reactor systems. !Recently, we succeeded in developing new V3Ga wires, fabricated via the PIT process using high Ga content Cu-Ga compounds above Cu-Ga solid solution composition. Jc and Hc2enhancements of V3Ga wire due to increasing three times of the V3Ga volume fraction were also confirmed. For the further microstructure control, in-situ observation of diffusion reaction with increase of temperature using High-Temperature X-ray diffraction (HT-XRD) was measured. Various high Ga content Cu-Ga compounds were composed with Cu3Ga (β phase: 30at%Ga), Cu9Ga4(γphase: 40at%Ga) and CuGa2 (δ phase: 64at%Ga) compounds. Especially, CuGa2 compound has much lower melting point (254 °C) compared with various Cu-Ga compounds. In the case of diffusion reaction including CuGa2 phase, V3Ga phase was formed by the second step diffusion reactions; the first one is solid-liquid diffusion between the dissociated Ga liquid phase and metal V, the second one is soild-solid diffusion reaction between solid phase formed by the first step reaction and metal V.
AB - V3Ga compound has a shorter radioactive decay time compared with Nb-based compounds and it will be one of the candidate superconducting magnet materials for advanced low activation fusion reactor systems. !Recently, we succeeded in developing new V3Ga wires, fabricated via the PIT process using high Ga content Cu-Ga compounds above Cu-Ga solid solution composition. Jc and Hc2enhancements of V3Ga wire due to increasing three times of the V3Ga volume fraction were also confirmed. For the further microstructure control, in-situ observation of diffusion reaction with increase of temperature using High-Temperature X-ray diffraction (HT-XRD) was measured. Various high Ga content Cu-Ga compounds were composed with Cu3Ga (β phase: 30at%Ga), Cu9Ga4(γphase: 40at%Ga) and CuGa2 (δ phase: 64at%Ga) compounds. Especially, CuGa2 compound has much lower melting point (254 °C) compared with various Cu-Ga compounds. In the case of diffusion reaction including CuGa2 phase, V3Ga phase was formed by the second step diffusion reactions; the first one is solid-liquid diffusion between the dissociated Ga liquid phase and metal V, the second one is soild-solid diffusion reaction between solid phase formed by the first step reaction and metal V.
KW - Diffusion reaction mechanism
KW - High ga content compound
KW - Ht-xrd
KW - Vga phase
UR - http://www.scopus.com/inward/record.url?scp=84960387145&partnerID=8YFLogxK
U2 - 10.1016/j.phpro.2012.06.120
DO - 10.1016/j.phpro.2012.06.120
M3 - 会議記事
AN - SCOPUS:84960387145
SN - 1875-3884
VL - 36
SP - 1492
EP - 1497
JO - Physics Procedia
JF - Physics Procedia
T2 - Superconductivity Centennial Conference, SCC 2011
Y2 - 18 September 2011 through 23 September 2011
ER -