The analysis of structure for the multi-layered of Ge/TiO2 films prepared by the differential prressure co-sputtering

Y. Adachi; S. Abe; K. Matsuda; M. Nose

doi:10.1515/amm-2015-0239

The analysis of structure for the multi-layered of Ge/TiO₂ films prepared by the differential prressure co-sputtering

Y. Adachi^*, S. Abe, K. Matsuda, M. Nose

^*Corresponding author for this work

Materials Design and Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

We tried to fabricate the Ge/TiO₂ composite films with the differential pressure (pumping) co-sputtering (DPCS) apparatus in order to improve the optical properties. In the study, the micro structure of these thin films has been evaluated. TEM image revealed that the thin film was alternately layered with TiO₂ and Ge, lattice fringes were observed both of Ge layer and TiO₂ layer. There were portions that lattice fringe of Ge was disturbed near the interface of Ge and TiO₂. X-ray photoelectron spectroscopy elucidated that there were few germanium oxides and a part with the thin film after annealed.

Original language	English
Pages (from-to)	963-964
Number of pages	2
Journal	Archives of Metallurgy and Materials
Volume	60
Issue number	2A
DOIs	https://doi.org/10.1515/amm-2015-0239
State	Published - 2015

Keywords

Ge
Solar cells
Sputtering
TiO

ASJC Scopus subject areas

Metals and Alloys

Access to Document

10.1515/amm-2015-0239

Cite this

@article{879595f4eefd47d2906115c49caf8c72,

title = "The analysis of structure for the multi-layered of Ge/TiO2 films prepared by the differential prressure co-sputtering",

abstract = "We tried to fabricate the Ge/TiO2 composite films with the differential pressure (pumping) co-sputtering (DPCS) apparatus in order to improve the optical properties. In the study, the micro structure of these thin films has been evaluated. TEM image revealed that the thin film was alternately layered with TiO2 and Ge, lattice fringes were observed both of Ge layer and TiO2 layer. There were portions that lattice fringe of Ge was disturbed near the interface of Ge and TiO2. X-ray photoelectron spectroscopy elucidated that there were few germanium oxides and a part with the thin film after annealed.",

keywords = "Ge, Solar cells, Sputtering, TiO",

author = "Y. Adachi and S. Abe and K. Matsuda and M. Nose",

year = "2015",

doi = "10.1515/amm-2015-0239",

language = "英語",

volume = "60",

pages = "963--964",

journal = "Archives of Metallurgy and Materials",

issn = "1733-3490",

publisher = "Polish Academy of Sciences, Institute of Metallurgy and Materials Science",

number = "2A",

}

TY - JOUR

T1 - The analysis of structure for the multi-layered of Ge/TiO2 films prepared by the differential prressure co-sputtering

AU - Adachi, Y.

AU - Abe, S.

AU - Matsuda, K.

AU - Nose, M.

PY - 2015

Y1 - 2015

N2 - We tried to fabricate the Ge/TiO2 composite films with the differential pressure (pumping) co-sputtering (DPCS) apparatus in order to improve the optical properties. In the study, the micro structure of these thin films has been evaluated. TEM image revealed that the thin film was alternately layered with TiO2 and Ge, lattice fringes were observed both of Ge layer and TiO2 layer. There were portions that lattice fringe of Ge was disturbed near the interface of Ge and TiO2. X-ray photoelectron spectroscopy elucidated that there were few germanium oxides and a part with the thin film after annealed.

AB - We tried to fabricate the Ge/TiO2 composite films with the differential pressure (pumping) co-sputtering (DPCS) apparatus in order to improve the optical properties. In the study, the micro structure of these thin films has been evaluated. TEM image revealed that the thin film was alternately layered with TiO2 and Ge, lattice fringes were observed both of Ge layer and TiO2 layer. There were portions that lattice fringe of Ge was disturbed near the interface of Ge and TiO2. X-ray photoelectron spectroscopy elucidated that there were few germanium oxides and a part with the thin film after annealed.

KW - Ge

KW - Solar cells

KW - Sputtering

KW - TiO

UR - http://www.scopus.com/inward/record.url?scp=84959878309&partnerID=8YFLogxK

U2 - 10.1515/amm-2015-0239

DO - 10.1515/amm-2015-0239

M3 - 学術論文

AN - SCOPUS:84959878309

SN - 1733-3490

VL - 60

SP - 963

EP - 964

JO - Archives of Metallurgy and Materials

JF - Archives of Metallurgy and Materials

IS - 2A

ER -