Abstract
This study investigates the preparation of Ge/TiO2 multi-layer films using a differential-pumping co-sputtering system (DPCS). This system has two chambers with different atmospheres, pure Ar for the Ge target and 0.5%O2 in Ar for the TiO2 ceramic target. The optical absorption spectra of the multi-layer films obviously shift to visible and near-infrared regions with increasing Ge layer thickness, while keeping O/Ti composition ratios of 2.3 ± 0.1 in TiO2. X-ray diffraction results indicate that the TiO2 layer forms a single-phase anatase structure in the multi-layer films. X-ray photoelectron spectroscopy also indicates that metallic Ge is dominant in the multi-layer film with negligible Ge-oxide. Therefore, DPCS provides a multi-layer film with a single-phase anatase structure in the TiO2 layer and a dominant metallic element in the Ge layer.
Original language | English |
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Pages (from-to) | 104-108 |
Number of pages | 5 |
Journal | Thin Solid Films |
Volume | 562 |
DOIs | |
State | Published - 2014/07/01 |
Keywords
- Germanium
- Radio-frequency sputtering
- Titanium dioxide
- Transmission electron microscopy
- Transmittance
- X-ray diffraction
- X-ray photoelectron spectroscopy
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry