Single-phase anatase structure and dominant metallic Ge in Ge/TiO 2 multi-layer films using a differential pumping co-sputtering system

Seishi Abe*, Yoshitaka Adachi, Kenji Matsuda, Masateru Nose

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

This study investigates the preparation of Ge/TiO2 multi-layer films using a differential-pumping co-sputtering system (DPCS). This system has two chambers with different atmospheres, pure Ar for the Ge target and 0.5%O2 in Ar for the TiO2 ceramic target. The optical absorption spectra of the multi-layer films obviously shift to visible and near-infrared regions with increasing Ge layer thickness, while keeping O/Ti composition ratios of 2.3 ± 0.1 in TiO2. X-ray diffraction results indicate that the TiO2 layer forms a single-phase anatase structure in the multi-layer films. X-ray photoelectron spectroscopy also indicates that metallic Ge is dominant in the multi-layer film with negligible Ge-oxide. Therefore, DPCS provides a multi-layer film with a single-phase anatase structure in the TiO2 layer and a dominant metallic element in the Ge layer.

Original languageEnglish
Pages (from-to)104-108
Number of pages5
JournalThin Solid Films
Volume562
DOIs
StatePublished - 2014/07/01

Keywords

  • Germanium
  • Radio-frequency sputtering
  • Titanium dioxide
  • Transmission electron microscopy
  • Transmittance
  • X-ray diffraction
  • X-ray photoelectron spectroscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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