Near-field slit probe incorporating a micromachined silicon chip for millimeter-wave microscopy

Tatsuo Nozokido*, Noriyuki Miyasaka, Jongsuck Bae

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

A novel type of slit probe incorporating a micromachined silicon (Si) chip for millimeter-wave scanning near-field microscopy is proposed.To improve the spatial resolution and image contrast attainable in millimeter-wave microscopy, a metal-coated Si chip with a microslit aperture fabricated using a bulk micromachining technique was attached to the tip of an ordinary slit-type probe at the end of a tapered rectangular waveguide. The design and fabrication of the Si chip are described, and the results from experiments performed at U-band (40-60 GHz) frequencies to demonstrate the feasibility of this new probe configuration are presented.

Original languageEnglish
Pages (from-to)660-664
Number of pages5
JournalMicrowave and Optical Technology Letters
Volume53
Issue number3
DOIs
StatePublished - 2011/03

Keywords

  • bulk micromachining
  • millimeter-wave imaging
  • near-field probes
  • scanning near-field microscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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