Low-frequency sheath instability stimulated by an energetic ion component

Mikhail Starodubtsev*, Md Kamal-Al-Hassan, Hiroaki Ito, Noboru Yugami, Yasushi Nishida

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

26 Scopus citations

Abstract

Spontaneous low-frequency oscillations have been observed in the circuit of a positively biased electrode immersed in a non-Maxwellian laboratory plasma containing an energetic ion component produced by the resonant absorption of a short microwave pulse in a nonuniform plasma column. The oscillations are found to be due to an instability of the electron-rich sheath. The instability with its characteristic frequency below the ion plasma frequency is driven by the energetic ion component reflected in the sheath area. A qualitative model of the instability is suggested.

Original languageEnglish
Article number012103
Pages (from-to)1-7
Number of pages7
JournalPhysics of Plasmas
Volume13
Issue number1
DOIs
StatePublished - 2006/01

ASJC Scopus subject areas

  • Condensed Matter Physics

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