Influence of effective surface area on gas sensing properties of WO3 sputtered thin films

Yanbai Shen, Toshinari Yamazaki*, Zhifu Liu, Dan Meng, Toshio Kikuta, Noriyuki Nakatani

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

166 Scopus citations

Abstract

WO3 thin films having different effective surface areas were deposited under various discharge gas pressures at room temperature by using reactive magnetron sputtering. The microstructure of WO3 thin films was investigated by X-ray diffraction, scanning electron microscopy, and by the measurement of physical adsorption isotherms. The effective surface area and pore volume of WO3 thin films increase with increasing discharge gas pressure from 0.4 to 12 Pa. Gas sensors based on WO3 thin films show reversible response to NO2 gas and H2 gas at an operating temperature of 50-300 °C. The peak sensitivity is found at 200 °C for NO2 gas and the peak sensitivity appears at 300 °C for H2 gas. For both kinds of detected gases, the sensor sensitivity increases linearly with an increase of effective surface area of WO3 thin films. The results demonstrate the importance of achieving high effective surface area on improving the gas sensing performance.

Original languageEnglish
Pages (from-to)2069-2072
Number of pages4
JournalThin Solid Films
Volume517
Issue number6
DOIs
StatePublished - 2009/01/30

Keywords

  • Effective surface area
  • Gas sensor
  • H
  • NO
  • Sputtering
  • Thin film
  • Tungsten oxide

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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