Formation and physical properties of Al base alloys by sputtering

M. Naka; T. Shibayanagi; M. Maeda; S. Zhao; H. Mori

doi:10.1016/S0042-207X(00)00277-3

Formation and physical properties of Al base alloys by sputtering

M. Naka^*, T. Shibayanagi, M. Maeda, S. Zhao, H. Mori

^*Corresponding author for this work

Materials Design and Engineering

Research output: Contribution to journal › Article › peer-review

23 Scopus citations

Abstract

Ti-Al and Ti-Si alloys were prepared by RF sputtering in a low-pressure argon atmosphere. The microhardness and thermal stability of these alloys were investigated in relation to the structure of alloys. In Al-Ti system, an amorphous phase and AlTi₃ were formed in the composition range of 35-60at%Ti and 60-80.5at%Ti, respectively. In Al-Si system, an amorphous phase was formed for Si content of 45at% or more. Although the microhardeness of Al-Ti alloys shows a maximum at 50at%Ti, its value for Al-Si alloys rises with increasing Si content. These results suggest that the atomic bonding character is different in both alloys, and the covalent character becomes stronger for Si rich Al-Si alloys.

Original language	English
Pages (from-to)	252-259
Number of pages	8
Journal	Vacuum
Volume	59
Issue number	1
DOIs	https://doi.org/10.1016/S0042-207X(00)00277-3
State	Published - 2000/10

ASJC Scopus subject areas

Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films

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title = "Formation and physical properties of Al base alloys by sputtering",

abstract = "Ti-Al and Ti-Si alloys were prepared by RF sputtering in a low-pressure argon atmosphere. The microhardness and thermal stability of these alloys were investigated in relation to the structure of alloys. In Al-Ti system, an amorphous phase and AlTi3 were formed in the composition range of 35-60at%Ti and 60-80.5at%Ti, respectively. In Al-Si system, an amorphous phase was formed for Si content of 45at% or more. Although the microhardeness of Al-Ti alloys shows a maximum at 50at%Ti, its value for Al-Si alloys rises with increasing Si content. These results suggest that the atomic bonding character is different in both alloys, and the covalent character becomes stronger for Si rich Al-Si alloys.",

author = "M. Naka and T. Shibayanagi and M. Maeda and S. Zhao and H. Mori",

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T1 - Formation and physical properties of Al base alloys by sputtering

AU - Naka, M.

AU - Shibayanagi, T.

AU - Maeda, M.

AU - Zhao, S.

AU - Mori, H.

PY - 2000/10

Y1 - 2000/10

N2 - Ti-Al and Ti-Si alloys were prepared by RF sputtering in a low-pressure argon atmosphere. The microhardness and thermal stability of these alloys were investigated in relation to the structure of alloys. In Al-Ti system, an amorphous phase and AlTi3 were formed in the composition range of 35-60at%Ti and 60-80.5at%Ti, respectively. In Al-Si system, an amorphous phase was formed for Si content of 45at% or more. Although the microhardeness of Al-Ti alloys shows a maximum at 50at%Ti, its value for Al-Si alloys rises with increasing Si content. These results suggest that the atomic bonding character is different in both alloys, and the covalent character becomes stronger for Si rich Al-Si alloys.

AB - Ti-Al and Ti-Si alloys were prepared by RF sputtering in a low-pressure argon atmosphere. The microhardness and thermal stability of these alloys were investigated in relation to the structure of alloys. In Al-Ti system, an amorphous phase and AlTi3 were formed in the composition range of 35-60at%Ti and 60-80.5at%Ti, respectively. In Al-Si system, an amorphous phase was formed for Si content of 45at% or more. Although the microhardeness of Al-Ti alloys shows a maximum at 50at%Ti, its value for Al-Si alloys rises with increasing Si content. These results suggest that the atomic bonding character is different in both alloys, and the covalent character becomes stronger for Si rich Al-Si alloys.

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DO - 10.1016/S0042-207X(00)00277-3

M3 - 学術論文

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SN - 0042-207X

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JO - Vacuum

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Formation and physical properties of Al base alloys by sputtering

Abstract

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