Fabrication of DLC films by pulsed ion beam ablation in a dense plasma focus device

Z. P. Wang*, H. R. Yousefi, Y. Nishino, H. Ito, K. Masugata

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

32 Scopus citations

Abstract

The pulsed intense ion beam, emitted from a dense plasma focus (DPF) discharges performed with hydrogen gas, has been used to ablate the graphite target depositing diamond-like carbon (DLC) films on Si substrates. The substrates were mounted on a holder, which allowed for deposition at positions between normal and 20° off-normal to the target. The samples were removed for analysis after 10 and 20 shots. Nano-particles were observed in the films by a field-emission scanning electron microscope. Raman spectra indicate that sample deposited at 20° off-normal with 20 shots possesses the highest sp3 content among the samples. The film deposited at this position was also found has the highest hardness.

Original languageEnglish
Pages (from-to)4169-4173
Number of pages5
JournalPhysics Letters, Section A: General, Atomic and Solid State Physics
Volume373
Issue number45
DOIs
StatePublished - 2009/11/02

Keywords

  • Dense plasma focus (DPF)
  • Diamond-like carbon (DLC)
  • Pulsed ion beam ablation

ASJC Scopus subject areas

  • General Physics and Astronomy

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