| Original language | Japanese |
|---|---|
| Journal | Applied Physics Letters |
| Volume | 106 |
| Issue number | 14 |
| DOIs | |
| State | Published - 2015 |
| Externally published | Yes |
Electrical activation and electron spin resonance measurements of arsenic implanted in silicon
M. Hori, M. Uematsu, A. Fujiwara, Y. Ono
Research output: Contribution to journal › Article › peer-review