DNA cleavage using semiconductor-photocatalysts

H. Kamioka; M. Suzuki; E. Tamiya; I. Karube

doi:10.1016/0304-5102(89)80133-6

DNA cleavage using semiconductor-photocatalysts

H. Kamioka^*, M. Suzuki, E. Tamiya, I. Karube

^*Corresponding author for this work

Electric and Electronic Engineering

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

Semiconductor-photocatalysts were used as double-stranded DNA cleaving agents. In particular, WO₃ had the highest activity in DNA cleavage. DNA cleavage was induced by irradiation for only 30 s using WO₃, and was more inhibited by tryptophan than by histidine. Hydroxy radicals played a more important role than oxygen radicals in the cleavage process, as shown from NBT analysis and the ESR spectrum using DMPO as a radical trap. The inhibiting effect on DNA cleavage increased with increasing recognition sites of a DNA binding protein.

Original language	English
Pages (from-to)	1-8
Number of pages	8
Journal	Journal of Molecular Catalysis
Volume	54
Issue number	1
DOIs	https://doi.org/10.1016/0304-5102(89)80133-6
State	Published - 1989/09/01

ASJC Scopus subject areas

General Engineering

Access to Document

10.1016/0304-5102(89)80133-6

Cite this

@article{abaf321d39b2450eb5f5ed50c6a1fb63,

title = "DNA cleavage using semiconductor-photocatalysts",

abstract = "Semiconductor-photocatalysts were used as double-stranded DNA cleaving agents. In particular, WO3 had the highest activity in DNA cleavage. DNA cleavage was induced by irradiation for only 30 s using WO3, and was more inhibited by tryptophan than by histidine. Hydroxy radicals played a more important role than oxygen radicals in the cleavage process, as shown from NBT analysis and the ESR spectrum using DMPO as a radical trap. The inhibiting effect on DNA cleavage increased with increasing recognition sites of a DNA binding protein.",

author = "H. Kamioka and M. Suzuki and E. Tamiya and I. Karube",

year = "1989",

month = sep,

day = "1",

doi = "10.1016/0304-5102(89)80133-6",

language = "英語",

volume = "54",

pages = "1--8",

journal = "Journal of Molecular Catalysis",

issn = "0304-5102",

publisher = "Elsevier B.V.",

number = "1",

}

TY - JOUR

T1 - DNA cleavage using semiconductor-photocatalysts

AU - Kamioka, H.

AU - Suzuki, M.

AU - Tamiya, E.

AU - Karube, I.

PY - 1989/9/1

Y1 - 1989/9/1

N2 - Semiconductor-photocatalysts were used as double-stranded DNA cleaving agents. In particular, WO3 had the highest activity in DNA cleavage. DNA cleavage was induced by irradiation for only 30 s using WO3, and was more inhibited by tryptophan than by histidine. Hydroxy radicals played a more important role than oxygen radicals in the cleavage process, as shown from NBT analysis and the ESR spectrum using DMPO as a radical trap. The inhibiting effect on DNA cleavage increased with increasing recognition sites of a DNA binding protein.

AB - Semiconductor-photocatalysts were used as double-stranded DNA cleaving agents. In particular, WO3 had the highest activity in DNA cleavage. DNA cleavage was induced by irradiation for only 30 s using WO3, and was more inhibited by tryptophan than by histidine. Hydroxy radicals played a more important role than oxygen radicals in the cleavage process, as shown from NBT analysis and the ESR spectrum using DMPO as a radical trap. The inhibiting effect on DNA cleavage increased with increasing recognition sites of a DNA binding protein.

UR - http://www.scopus.com/inward/record.url?scp=0024735268&partnerID=8YFLogxK

U2 - 10.1016/0304-5102(89)80133-6

DO - 10.1016/0304-5102(89)80133-6

M3 - 学術論文

AN - SCOPUS:0024735268

SN - 0304-5102

VL - 54

SP - 1

EP - 8

JO - Journal of Molecular Catalysis

JF - Journal of Molecular Catalysis

IS - 1

ER -

DNA cleavage using semiconductor-photocatalysts

Abstract

ASJC Scopus subject areas

Access to Document

Fingerprint

Cite this