Diffusional behavior of tritium in V-4Cr-4Ti alloy

K. Hashizume; J. Masuda; T. Otsuka; T. Tanabe; Y. Hatano; Y. Nakamura; T. Nagasaka; T. Muroga

doi:10.1016/j.jnucmat.2007.03.239

Diffusional behavior of tritium in V-4Cr-4Ti alloy

K. Hashizume^*, J. Masuda, T. Otsuka, T. Tanabe, Y. Hatano, Y. Nakamura, T. Nagasaka, T. Muroga

^*Corresponding author for this work

Hydrogen Isotope Research Center, Organization for Promotion of Research

Research output: Contribution to journal › Article › peer-review

18 Scopus citations

Abstract

Tritium diffusion behavior in a V-4Cr-4Ti (NIFS-Heat-2) alloy has been examined with a tritium tracer technique. Firstly, a small amount of tritium (T) was implanted into the specimen surface, and then the specimen was diffusion-annealed at temperatures ranging from 373 K to 573 K. The diffusion depth profile of T in the specimen was measured with a tritium imaging plate (IP) technique to determine the diffusion coefficient. The obtained diffusion coefficient of tritium in V-4Cr-4Ti is expressed asD_t (cm² / s) = (7.5 ± 0.2) × 10^{- 4} exp (- 0.13 (eV) / kT),which is lower than that in pure vanadium, and is comparable with literature values of protium in a V-4Ti alloy taking the isotope mass effect into consideration.

Original language	English
Pages (from-to)	876-881
Number of pages	6
Journal	Journal of Nuclear Materials
Volume	367-370 A
Issue number	SPEC. ISS.
DOIs	https://doi.org/10.1016/j.jnucmat.2007.03.239
State	Published - 2007/08/01

ASJC Scopus subject areas

Nuclear and High Energy Physics
General Materials Science
Nuclear Energy and Engineering

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@article{b7f6aeb5d8284977b480bcc5135493c3,

title = "Diffusional behavior of tritium in V-4Cr-4Ti alloy",

abstract = "Tritium diffusion behavior in a V-4Cr-4Ti (NIFS-Heat-2) alloy has been examined with a tritium tracer technique. Firstly, a small amount of tritium (T) was implanted into the specimen surface, and then the specimen was diffusion-annealed at temperatures ranging from 373 K to 573 K. The diffusion depth profile of T in the specimen was measured with a tritium imaging plate (IP) technique to determine the diffusion coefficient. The obtained diffusion coefficient of tritium in V-4Cr-4Ti is expressed asDt (cm2 / s) = (7.5 ± 0.2) × 10- 4 exp (- 0.13 (eV) / kT),which is lower than that in pure vanadium, and is comparable with literature values of protium in a V-4Ti alloy taking the isotope mass effect into consideration.",

author = "K. Hashizume and J. Masuda and T. Otsuka and T. Tanabe and Y. Hatano and Y. Nakamura and T. Nagasaka and T. Muroga",

note = "Funding Information: This work has been conducted with the support of the NIFS LHD Project Research Collaboration and partly through a Grand-in-Aid for Scientific Research (A, 17206092) from the Ministry of Education, Culture, Sports, Science and Technology of the Japanese Government. ",

year = "2007",

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doi = "10.1016/j.jnucmat.2007.03.239",

language = "英語",

volume = "367-370 A",

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TY - JOUR

T1 - Diffusional behavior of tritium in V-4Cr-4Ti alloy

AU - Hashizume, K.

AU - Masuda, J.

AU - Otsuka, T.

AU - Tanabe, T.

AU - Hatano, Y.

AU - Nakamura, Y.

AU - Nagasaka, T.

AU - Muroga, T.

N1 - Funding Information: This work has been conducted with the support of the NIFS LHD Project Research Collaboration and partly through a Grand-in-Aid for Scientific Research (A, 17206092) from the Ministry of Education, Culture, Sports, Science and Technology of the Japanese Government.

PY - 2007/8/1

Y1 - 2007/8/1

N2 - Tritium diffusion behavior in a V-4Cr-4Ti (NIFS-Heat-2) alloy has been examined with a tritium tracer technique. Firstly, a small amount of tritium (T) was implanted into the specimen surface, and then the specimen was diffusion-annealed at temperatures ranging from 373 K to 573 K. The diffusion depth profile of T in the specimen was measured with a tritium imaging plate (IP) technique to determine the diffusion coefficient. The obtained diffusion coefficient of tritium in V-4Cr-4Ti is expressed asDt (cm2 / s) = (7.5 ± 0.2) × 10- 4 exp (- 0.13 (eV) / kT),which is lower than that in pure vanadium, and is comparable with literature values of protium in a V-4Ti alloy taking the isotope mass effect into consideration.

AB - Tritium diffusion behavior in a V-4Cr-4Ti (NIFS-Heat-2) alloy has been examined with a tritium tracer technique. Firstly, a small amount of tritium (T) was implanted into the specimen surface, and then the specimen was diffusion-annealed at temperatures ranging from 373 K to 573 K. The diffusion depth profile of T in the specimen was measured with a tritium imaging plate (IP) technique to determine the diffusion coefficient. The obtained diffusion coefficient of tritium in V-4Cr-4Ti is expressed asDt (cm2 / s) = (7.5 ± 0.2) × 10- 4 exp (- 0.13 (eV) / kT),which is lower than that in pure vanadium, and is comparable with literature values of protium in a V-4Ti alloy taking the isotope mass effect into consideration.

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DO - 10.1016/j.jnucmat.2007.03.239

M3 - 学術論文

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SN - 0022-3115

VL - 367-370 A

SP - 876

EP - 881

JO - Journal of Nuclear Materials

JF - Journal of Nuclear Materials

IS - SPEC. ISS.

ER -

Diffusional behavior of tritium in V-4Cr-4Ti alloy

Abstract

ASJC Scopus subject areas

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