Characteristics of electron cyclotron resonance plasma generated in a rectangular waveguide by high-power microwave

Lekha Nath Mishra*, Kanetoshi Shibata, Hiroaki Ito, Noboru Yugami, Yasushi Nishida

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

The generation of overdense plasma using an electron cycltron resonance (ECR) technique in a rectangular waveguide by high power microwave, was discussed. The plasma density about 1012 cm-3 and electron temperature 8 - 12 eV were observed using a Langmuir probe. It was shown that these parameters can be cntrolled by adjusting the magnetic fields, gas pressure and/or microwave power. This plasma can be used in plasma processing and for the plasma-based particle accelerator.

Original languageEnglish
Pages (from-to)84-89
Number of pages6
JournalReview of Scientific Instruments
Volume75
Issue number1
DOIs
StatePublished - 2004/01

ASJC Scopus subject areas

  • Instrumentation

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