TY - JOUR
T1 - A comparative study of CrAlN films synthesized by dc and pulsed dc reactive magnetron facing target sputtering system with different pulse frequencies
AU - Khamseh, S.
AU - Nose, M.
AU - Kawabata, T.
AU - Nagae, T.
AU - Matsuda, K.
AU - Ikeno, S.
N1 - Funding Information:
The authors wish to express their thanks for the financial support by a grant for scientific research from Japan Society for the Promotion of Science .
PY - 2010/10/15
Y1 - 2010/10/15
N2 - CrAlN films were prepared using a balanced magnetron sputtering system operated in dc and pulsed condition (with different pulse frequencies), and their phase composition were then determined through XRD analysis. In order to investigate the relationship between the mechanical properties and microstructure of the films, hardness measurements were taken using a nanoindentation system. All films exhibited NaCl-type CrN structure in both dc and pulsed conditions. Plastic hardness, Hpl, of the films ranged between 15 to 36 GPa. Pulsed prepared CrAlN films showed higher hardness, higher internal stress values, and smaller grain sizes than dc prepared CrAlN film. Moreover, plastic hardness and internal stress of pulsed prepared CrAlN films increased on increasing pulse frequency.
AB - CrAlN films were prepared using a balanced magnetron sputtering system operated in dc and pulsed condition (with different pulse frequencies), and their phase composition were then determined through XRD analysis. In order to investigate the relationship between the mechanical properties and microstructure of the films, hardness measurements were taken using a nanoindentation system. All films exhibited NaCl-type CrN structure in both dc and pulsed conditions. Plastic hardness, Hpl, of the films ranged between 15 to 36 GPa. Pulsed prepared CrAlN films showed higher hardness, higher internal stress values, and smaller grain sizes than dc prepared CrAlN film. Moreover, plastic hardness and internal stress of pulsed prepared CrAlN films increased on increasing pulse frequency.
KW - Balanced magnetron sputtering
KW - CrAlN
KW - Pulse frequency
KW - Pulsed magnetron sputtering
KW - dc Magnetron sputtering
UR - http://www.scopus.com/inward/record.url?scp=77957335781&partnerID=8YFLogxK
U2 - 10.1016/j.jallcom.2010.08.042
DO - 10.1016/j.jallcom.2010.08.042
M3 - 学術論文
AN - SCOPUS:77957335781
SN - 0925-8388
VL - 508
SP - 191
EP - 195
JO - Journal of Alloys and Compounds
JF - Journal of Alloys and Compounds
IS - 1
ER -